Canon: valuation, funding, and the secondary tape

Japanese lithography and imaging group (TSE: 7751). Holds the top share in i-line lithography and sells KrF/ArF scanners, plus the FPA-1200NZ2C nanoimprint (NIL) tool launched Oct 2023 at a 14nm minimum linewidth (5nm-class), with 10nm/2nm-class claimed to need further mask progress. Also one of Rapidus's 32 private investors and, per Nikkei (Mar 2026), the first major domestic customer candidate for 2nm prototype image-processing chips.

Sector: semiconductor equipment · stage: public · HQ: Tokyo, Japan company site

The short version

• No priced instruments on record yet; milestones only.

Corporate structure

• Competes with (graph-recorded): ASML Holding

Supply chain (graph-recorded)

• Customer of: Rapidus

Related companies

• Sector peers: BE Semiconductor (Besi), Edwards Vacuum, HPSP, Hanmi Semiconductor, Ichor Holdings, MKS Instruments

Recent milestones

• 2026-10-22 - Canon plans to raise lithography equipment output 1.5-2x in 2027 from an expected 227 units this year, using the Utsunomiya plant completed
• 2024-10-01 - First commercial NIL system delivered to the Texas Institute for Electronics -- a university-affiliated R&D institute doing prototyping, not
• 2024-10-01 - Canon's stated NIL roadmap to 2028 targets 3D NAND at 20nm line width / 5nm overlay, DRAM at 10nm / 2nm, and logic at 8nm / 1.6nm -- targets
• 2023-10-13 - Canon launches the FPA-1200NZ2C nanoimprint lithography system: pattern transfer by pressing a mask into resist, no optical mechanism, minim

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Derived from the SOMEN graph at render time.